【摘 要】
：
Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5–28.5 nm at incidence angle of 5? is developed using a numerical optimized method. The multilayer i
【机 构】
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ShanghaiKeyLaboratoryofSpecialArtificialMicrostructureMaterialsandTechnology,InstituteofPrecisionOpt
【出 处】
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ChineseOpticsLetters
论文部分内容阅读
Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5–28.5 nm at incidence angle of 5? is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5–28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.
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