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美国模拟器件公司(Analog Devices,ADI)近日发布了一种创新的半导体制造工艺 iCMOS(工业CMOS),它将高电压半导体工艺与亚微米CMOS(互补金属氧化物半导体)和互补双极型工艺相结合,使诸如工企自动化和过程控制等高电压应用在性能、设计和节省成
Analog Devices (ADI) recently released iCMOS (Industrial CMOS), an innovative semiconductor manufacturing process that combines high voltage semiconductor processes with submicron CMOS (Complementary Metal Oxide Semiconductor) and complementary bipolar process Combine to enable high-voltage applications such as industrial automation and process control in performance, design and savings