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对来自海南省13个地区的67个Colletotrichum musae（Berk. & Curt.）Arx菌株进行抗药性检测，所测菌株均表现出敏感，即未产生特克多抗药性。室内采用高浓度特克多和90～95%致死剂量紫外光进行抗性诱导，获得的抗性菌株均能在1000g/ml特克多的PDA培养基上生长，但EC50值相差很大，最高达130g/ml，而最低为0.87g/ml。抗性菌株对多菌灵和甲基托布津均表现正交互抗药性。连续无毒培养10代后，所有菌株仍可在5g/ml特克多的培养基上生长，表现抗性遗传稳定。抗性菌株的产孢能力和致病力与敏感菌相比并没有下降，表现很高的适应能力。
Sixty-seven Colletotrichum musae (Berk. & Curt.) Arx isolates from 13 areas in Hainan Province were tested for drug resistance. All tested strains were sensitive, that is, did not produce drug resistance. The indoor use of high concentration of teloctanoic acid and 90 ~ 95% lethal dose of ultraviolet light resistance, resistance strains obtained can grow on PDA medium 1000g / ml Turk, but the EC50 values vary greatly, the highest Up to 130g / ml, while the lowest is 0.87g / ml. The resistant strains showed both orthogonal to both carbendazim and thiophanate-methyl. After ten consecutive generations of non-toxic culture, all the strains could still grow on the medium of 5 g / ml Turkoglu, showing the genetic stability of the resistance. The ability of sporulation and virulence of resistant strains did not decrease compared with that of susceptible ones, showing high adaptability.