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在相同的氨流量和氨压下,进行气体氮化与离子氮化的对比实验,证明离子氮化比气体氮化的效果好。用X射线衍射仪法和金相法观察离子轰击对试样表面的影响,说明离子轰击后的试样表面存在二类、三类应力,点阵发生严重畸变,并出现大小不等的坑洼,晶界处尤为显著。表层大量缺陷的存在,促进了氮的扩散过程。离子氮化后的金相试样,在稀薄空气中进行离子轰击,试样表面硬度大幅度上升,与高能粒子(γ射线、α射线以及β射线等)照射金属与合金引起的硬度上升相似。这与轰击产生的畸变有关外,可能有新相析出,原因有待进一步探讨。用探极法测定了辉光放电等离子区的离子浓度,研究氨流量与离子浓度的关系,及对氮化层的影响,说明在大氨流量下离子浓度下降,氮化层深度减少,证明采用小氨流量是合理的。
Under the same ammonia flow rate and ammonia pressure, comparative experiments of gas nitriding and ion nitriding show that ion nitriding is more effective than gas nitriding. The effects of ion bombardment on the surface of the sample were observed by X-ray diffraction and metallographic methods. The results showed that there were two types of stress and three types of stress on the sample surface after ion bombardment. The lattice was seriously distorted and pits and crystals The sector is particularly significant. The existence of a large number of surface defects, promoting the diffusion process of nitrogen. Ion nitriding metallographic sample, in thin air ion bombardment, the sample surface hardness increased significantly, and high-energy particles (γ-rays, α-rays and β-rays, etc.) irradiation of metals and alloys caused by the hardness rise similar. This is related to the distortion caused by the bombardment, and there may be new phases precipitated. The reason for further discussion. The ion concentration of glow discharge plasma was measured by the probe method. The relationship between ammonia flow and ion concentration and the effect on the nitride layer were studied. The results showed that the ion concentration decreased and the depth of the nitride layer decreased under the flow of large ammonia. Small ammonia flow is reasonable.