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采用射频磁控溅射的方法通过改变氧分压和基体温度在非晶超白玻璃上沉积了一系列Nb掺杂Ti O_2薄膜,富氧状态下的薄膜为锐钛矿相且绝缘,少氧状态下的薄膜为金红石相但电阻率太大。采用双层膜的结构,首先将在非晶基体上沉积一系列在富氧状态下得到的的锐钛矿相Nb掺杂Ti O_2薄膜为种子层,然后在种子层上外延一层少氧状态下的Nb掺杂Ti O2薄膜为表层,得到的薄膜具有良好的导电性。
A series of Nb doped Ti O 2 thin films were deposited on amorphous ultra-clear glass by changing the partial pressure of oxygen and the substrate temperature by RF magnetron sputtering. The film in the oxygen-rich state was anatase phase and was less oxygen The state of the film rutile phase but the resistivity is too large. The structure of the bilayer membrane is firstly deposited on the amorphous substrate by a series of Nb doped Ti O 2 thin films of anatase phase obtained under the state of oxygen enrichment as the seed layer and then epitaxial on the seed layer in a less oxygen state Under the Nb doped Ti O2 film as the surface layer, the resulting film has good electrical conductivity.