据报导,西德采用了一种新的投影物镜,用它可制作2微米宽的显影清晰的线条,还介绍了一种掩模调整显微镜。投影物镜一致公认,必须大大提高曝光掩模图形所用的物镜的性能。用蔡司S—普兰纳物镜就能得到较高的图象清晰度。除了玻璃熔化技术取得很大进展外,还出现了借助程序控制计算机计算物镜的新方法,以及校正物镜时衬度传递函数的计算,这些都为满足高要求而制作相应 It is reported that West Germany adopted a new projection objective lens, it can be used to produce clear lines of 2 microns wide and also introduced a mask to adjust the microscope. Projector projection unanimously recognized that the performance of the objective lens used to expose the mask pattern must be greatly enhanced. With Zeiss S-Planner lens will be able to get higher image clarity. In addition to great advances in glass melting technology, there have also been new methods of computer-controlled objective lens computation using program control as well as the calculation of the contrast transfer function of the objective lens, all of which are tailored to meet the high demands