论文部分内容阅读
本文利用我国1997年-2009年的面板数据,采取面板单位根检验、协整分析、误差修正模型等计量方法,探讨了高技术产业R&D资源投入与高技术产业发展间的关系。实证结果显示:①高技术产业R&D资源投入与产业发展存在长期均衡关系,其中产业研发经费支出与产业发展具有正向长期均衡关系,产业专利申请数与高技术产业发展具有反向长期均衡关系,而研发人员数量投入与产业发展之间的关系尚不明显;②高技术产业R&D资源投入与产业发展的长期均衡存在短期修正效应,具体来讲,产业研发经费支出及研发人员投入变量与高技术产业发展的长期均衡存在短期修正效应,而产业专利申请数变量与高技术产业发展的长期均衡不存在短期修正效应。加大创新人才培养和知识产权保护力度、推进技术成果转化吸收、增加高技术产业研发经费投入是保持高技术产业R&D资源投入与产业发展良性互动的有效途径。
In this paper, the panel data from 1997 to 2009 in our country are used to measure the relationship between R & D resource investment and the development of high-tech industries in the high-tech industry by using panel unit root test, co-integration analysis and error correction model. The empirical results show that: (1) There is a long-term equilibrium relationship between R & D resource input and industrial development in high-tech industry, in which the R & D expenditures and industry development have a positive long-term equilibrium relationship, the number of industrial patent applications and the development of high- However, there is still a short-term correction effect on the long-term equilibrium of R & D resources input and industrial development in high-tech industry. Specifically, the R & D expenditures and R & D personnel input variables and high-tech There is a short-term correction effect on long-term equilibrium in industrial development, while there is no short-term correction effect on the long-term equilibrium between the number of industrial patent applications and the development of high-tech industries. Increasing the training of innovative talents and protection of intellectual property rights, pushing forward the transformation and absorption of technological achievements and increasing the investment in R & D of high-tech industries are effective ways to maintain the benign interaction between R & D resources input in high-tech industries and industrial development.