一前言化学气相沉积(CVD)是一种较古老的技术,很早以前,人们就利用CVD技术生产碳黑、碳丝等物质。随着科学技术的进步,CVD本身也得到很大的发展,而且有新的改进,如等离子CVD,激光CVD等。这些新型CVD大大降低了沉积温度,使得CVD技术在材料科学各领域中得到更广泛的应用,同时又发展了性能更优越的新材料品种。在炭素材料领域由于利用CVD技术可使一些传统材料的性能得以改进,如在石墨表面用CVD技术涂覆多种涂层,如PG、SiC A foreword Chemical vapor deposition (CVD) is an older technology, long ago, people used CVD technology to produce carbon black, carbon filament and other substances. With the progress of science and technology, CVD itself has also been greatly improved, and there are new improvements, such as plasma CVD, laser CVD. These new CVD greatly reduce the deposition temperature, making CVD technology more widely used in various fields of materials science, while developing new varieties of materials with superior performance. In the field of carbon materials, the performance of some conventional materials can be improved due to the use of CVD technology. For example, a variety of coatings such as PG, SiC