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采用自洽的蒙特卡罗 -流体结合模型对溅射过程进行模拟 ,以了解等离子体粒子行为与溅射参数的关系。溅射过程包括气体放电和溅射原子传输。对于气体放电 ,蒙特卡罗部分模拟快电子和快气体原子 ,而流体部分则描述离子和慢电子。对于溅射原子传输 ,蒙特卡罗部分模拟溅射原子的碰撞过程 ,而流体部分则描述溅射原子的扩散和漂移。模拟的结果包括 :等离子体粒子的密度和能量分布 ;不同电离机制对气体原子和溅射原子电离的贡献 ;不同等离子体粒子对阴极溅射碰撞的贡献 ;溅射原子的密度分布 ;溅射场和溅射粒子相对于入射离子能量和角度的分布 ;溅射原子经碰撞后在整个等离子体区的分布。
The self-consistent Monte Carlo-fluid model was used to simulate the sputtering process to understand the relationship between plasma particle behavior and sputtering parameters. Sputtering processes include gas discharge and sputter atomic transport. For gas discharges, the Monte Carlo part simulates fast electrons and fast gas atoms, while the fluid part describes ions and slow electrons. For sputter atomic transport, the Monte Carlo section simulates the sputtering process of the sputtered atoms while the fluid section describes the diffusion and drift of the sputtered atoms. The simulation results include the density and energy distribution of the plasma particles, the contribution of different ionization mechanisms to the ionization of gas atoms and sputtered atoms, the contribution of different plasma particles to the sputtering collision, the density distribution of sputtered atoms, And the distribution of the energy and angle of the sputtered particles with respect to the incident ions; the distribution of sputtered atoms throughout the plasma region after collision.