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采用原位卤化反应直接形成的ZrCl4气体作为Zr源,在硬质合金刀具上沉积CVD-ZrC涂层。用SEM,XRD分析检测了合金刀具基底不同表面上沉积生长ZrC涂层的厚度均匀性、沉积速率、形貌组织、织构取向;通过理论计算与工艺实际的涂层沉积转化率对比,定量表征了该沉积体系工艺参数下ZrC涂层的沉积转化率。结果显示,CVD涂层炉内不同位置合金刀片表面沉积的ZrC涂层均匀;由于工艺温度限制,涂层沉积速率较低;ZrCl4转化为ZrC涂层的工艺实际转化率约11%,在理论最大转化率14%范围内;相同温度下随着沉积压力升高,涂层的沉积转化率缓慢降低到10%并趋于稳定;直接在合金基底沉积形成的ZrC涂层为细小的颗粒状形貌,而在合金基底TiN涂层表面上沉积生长的ZrC具有典型的片状组织形貌;对应的涂层生长织构取向从(311)到(111)转变。
ZrCl4 gas formed directly from the in-situ halogenation reaction was used as the Zr source to deposit a CVD-ZrC coating on a cemented carbide tool. The thickness uniformity, deposition rate, morphology and texture orientation of the deposited ZrC coatings on different surfaces of the alloy tool were measured by SEM and XRD. By comparing the theoretical calculation with the actual coating deposition conversion, the quantitative characterization The deposition conversion rate of ZrC coating under the parameters of the deposition system. The results show that the ZrC coating deposited on the surface of the alloy blade at different positions in the CVD coating furnace is even; the deposition rate of the coating is lower due to the limitation of the process temperature; the conversion rate of ZrCl4 into ZrC coating is about 11% Conversion rate of 14%; at the same temperature with the deposition pressure increases, the coating deposition rate slowly reduced to 10% and tends to be stable; the ZrC coating deposited directly on the alloy substrate is a fine granular morphology While ZrC deposited on the surface of the TiN coating on the alloy substrate has a typical lamellar morphology. The corresponding coating grows from (311) to (111).