美国俄亥俄大学正在研究将全息摄影与空间滤光技术相结合的系统,该系统可能代替传统的光掩模制造装置。两个样机系统将立即用于缩小的光掩模的测试中。据称该系统在中间掩模/掩模/片子检查中可获得高得多的生产率,该系统也可在片子上直接复印芯片图形。它与传统的光学复印 The University of Ohio is studying a system that combines holography with spatial filter technology that may replace traditional photomask fabrication devices. Both prototype systems will be immediately used in the testing of reduced photomasks. The system is said to achieve much higher productivity in reticle / mask / film inspection and the system can also directly copy the chip graphics on the film. It is made with traditional optical copy