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针对高功率脉冲磁控溅射(HIPIMS)存在的低溅射率靶材放电时离化率有待进一步提高的问题,通过增加辅助阳极的方法来提高HIPIMS的离化率。研究了辅助阳极电压、阳极位置以及磁控阳极的类型对HIPIMS放电特性的影响。结果表明:随着阳极电压的增加,基体离子电流值逐渐增大,并且当阳极电压为90 V时,基体离子电流值最高可增加到4倍。随着阳极位置由45°位置处变化为180°位置处时,由于电场在与磁场垂直方向上的分量逐渐减少,导致了基体离子电流值呈现出逐渐下降的趋势。此外,当阳极附加扩散型非平衡磁场后,获得的基体离子电流值最大。辅助阳极处于不同位置时,随着阳极电压的增加,HIPIMS放电系统中Ar~0、Ar~(1+)、V~0和V~(1+)粒子谱线强度均有不同程度的增加。当阳极处于45°位置时,各种粒子谱线强度增加最为显著。增加辅助阳极后HIPIMS放电时真空室内各个位置处的基体离子电流值均有所增加,并且当阳极处于45°位置时的增加幅度最为明显,系统等离子体密度增幅最高可增加到3倍。
Aiming at the problem that the ionization rate of low sputter target with high sputtering power (HIPIMS) needs to be further improved, the ionization rate of HIPIMS can be increased by increasing the ancillary anode. The influence of auxiliary anode voltage, anode position and the type of magnetron anode on the discharge characteristics of HIPIMS was investigated. The results show that with the increase of anodic voltage, the ionic current of the matrix gradually increases, and the maximum of the ionic current of the matrix can increase to 4 times when the anode voltage is 90V. As the anode position is changed from 45 ° to 180 °, the ion current value of the substrate shows a gradual decrease due to the gradual decrease of the electric field in the direction perpendicular to the magnetic field. In addition, when the anode is attached to a diffusion-type unbalanced magnetic field, the value of the substrate ion current obtained is the largest. With the auxiliary anode in different positions, the intensity of Ar ~ 0, Ar ~ (1 +), V ~ 0 and V ~ (1 +) particles in HIPIMS discharge system increased with the increase of anode voltage. When the anode is at 45 °, the intensities of the various particle lines increase most significantly. After adding auxiliary anodes, the current value of matrix ion in each position of vacuum chamber increased when HIPIMS was discharged, and the most obvious increase was when the anode was at 45 °. The maximum increase of system plasma density could be increased to 3 times.