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利用直流磁控溅射的方法制备掺La和未掺La的Ca_(1-x)La_xB_6(x=0,0.01,0.02,0.03)薄膜。利用原子力显微镜对薄膜的表面形貌及厚度进行表征。掺La的薄膜的厚度约为未掺杂的两倍;La的掺杂会使薄膜的晶粒尺寸变大。利用X射线光电子能谱对薄膜表面的化学组成进行检测。薄膜中Ca/La比接近理论值,没有检测到其它的铁磁性杂质及元素,尤其是Fe。Ca_(0.98)La_(0.02)B_6薄膜具有最大的室温饱和磁化强度,强度值为84.54 emu/cm~3。同时薄膜的饱和磁化强度值随薄膜厚度的增加而降低。在Ca_(1-x)La_xB_6薄膜中,B_6空位是薄膜磁性的主要来源,其它类型的缺陷例如晶界等,同样影响着薄膜磁性的大小。
The Ca_ (1-x) La_xB_6 (x = 0,0.01,0.02,0.03) films doped with or without La were prepared by DC magnetron sputtering. The surface morphology and thickness of the films were characterized by AFM. The thickness of the La-doped film is about twice that of the undoped film; La doping will increase the grain size of the film. The chemical composition of the film surface was examined by X-ray photoelectron spectroscopy. The Ca / La ratio in the film is close to the theoretical value, and no other ferromagnetic impurities and elements, especially Fe, are detected. The Ca_ (0.98) La_ (0.02) B_6 thin film possesses the largest saturation magnetization at room temperature with an intensity of 84.54 emu / cm ~ 3. At the same time, the saturation magnetization value of the film decreases with the increase of the film thickness. In Ca1-xLa_xB_6 thin films, B_6 vacancy is the main source of thin film magnetic properties. Other types of defects, such as grain boundaries, also affect the magnetic properties of thin films.