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溅射时在基片下方放置磁铁 ,让来自基片下方的磁场发挥磁控作用 ,以此来研究基片下磁场磁控溅射的方法 .发现辉光形貌以及沉积的薄膜厚度分布均发生明显变化的同时 ,辉光的外形也随着外加磁铁直径的变化而变化 .运用磁荷理论对空间磁场分布进行模拟 ,解释了辉光形貌变化的机理 ;运用沉积粒子在外加梯度磁场中运动理论解释了膜厚分布 .
When sputtering, a magnet is placed under the substrate to make the magnetic field from the bottom of the substrate play a magnetron effect, so as to study the method of magnetron sputtering under the substrate. The glow morphology and the distribution of the deposited film thickness are found At the same time, the shape of the glow changes with the change of the diameter of the applied magnet.Using the magnetic charge theory to simulate the spatial magnetic field distribution, the mechanism of the change of the morphology of the glow is explained. By using the motion of the deposited particles in the gradient magnetic field The theory explains the film thickness distribution.