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高温超导涂层导体是解决当今能源危机的重要复合材料之一,而经济、有效、节能的制备技术是涂层导体广泛应用的关键.本文采用表面氧化外延法在Ni-wt.5%W基带上普氩下中温氧化制备了立方织构的NiO种子层.通过对氧化温度和氧化时间两个主要因素分析,确定了NiO生长条件为普氩中790℃内保温20mins。与高温(空气中1000℃以上)制备相比,降低了氧化膜制备温度.薄膜厚度大约为650nm.最后在生成的NiO薄膜上化学溶液沉积了YBa2Cu3O7-δ/SmBiO_3复合层,所得样品超导转变温度为89 K,77 K自场下临界电流密度为1.46 MA/cm2(77K,零场).中温表面氧化外延法为涂层导体制备提供了一种实用可行路径.
High-temperature superconducting coated conductors are one of the important composites to solve today’s energy crisis, and economical, effective and energy-saving preparation technology is the key to the widespread application of coated conductors.In this paper, surface oxidation epitaxy method was used in Ni-wt.5% W The cubic textured NiO seed layer was prepared by medium-temperature argon-argon oxidation at the medium temperature.By analyzing the two main factors of oxidation temperature and oxidation time, the NiO growth condition was determined as the holding time of 790 ℃ in Argon for 20mins. Compared with the high temperature (above 1000 ℃ in air), the preparation temperature of the oxide film is reduced, and the thickness of the film is about 650nm. Finally, the YBa2Cu3O7-δ / SmBiO_3 composite layer is deposited on the NiO film by chemical vapor deposition The critical current density at 77 K was 77 K (77K, zero field) at a temperature of 89 K at 77 K. The mid-temperature surface oxidation epitaxy method provided a practical and feasible route for the preparation of coated conductors.