A new approach for fabricating B4C/Cu graded composite by rapid self-resistance sintering under ultra-high pressure was presented, by which a near dense B4C/Cu graded composite with a compositional spectrum of 0-100% was successfully fabricated. Plasma relevant performances ofsintered B4C/Cu composite were preliminarily characterized, it is found that its chemical sputtering yield is 70% lower than that of SMF800 nuclear graphite under 2.7 keV D+ irradiation, and almost no damages after 66 shots of in situ plasma discharge in HL-1 Tokamak facility, which indicates B4C/Cu plasma facing component has a good physical and chemical sputtering resistance performance compared with nuclear graphite.