光刻胶浮雕全息图通常是作为复制模压全息图的母版，在复制过程中所转移的是全息沟纹信息，所复制的全息图的衍射效率决定于沟纹的深度，因此控制浮雕全息图的沟纹深度非常重要，本文通过测量光刻胶浮雕全息图的衍射光强来确定它具有的相位调制度，从而间接地找到了测量刻蚀深度的新方法，并利用它来指导拍摄有预期刻蚀深度的光刻胶浮雕全息图。 Photolithographic relief holograms are typically masters for replicated embossed holograms, where holographic groove information is transferred during the replication process and the diffraction efficiency of the hologram replicated depends on the depth of the grooves, thus controlling the relief hologram The depth of groove is very important. In this paper, we determine the phase modulation degree by measuring the diffracted light intensity of photoresist relief hologram, and indirectly find a new method to measure the depth of etching, and use it to guide the shooting expected Photoresist relief hologram with etch depth.