2003年11月5日,英特尔宣布已发现一种新型的、可以取代30多年来芯片制造业一直使用的制造材料。利用这种新型材料,英特尔研究人员已经开发出创记录的高性能晶体管。这种新材料被称为高K。英特尔说,新的高K材料在减少漏电的能力上将比二氧化硅提高100多倍。随着芯片制造商在微小的硅片上安装越来越多的晶体管,漏电现象已成 On November 5, 2003, Intel announced that it has found a new type of manufacturing material that has been superseded by the chip manufacturing industry for over 30 years. With this new material, Intel researchers have developed record high-performance transistors. This new material is called K Intel said the new high-K materials will be 100 times more effective at reducing leakage than silicon dioxide. As chip makers install more and more transistors on tiny wafers, leakage has become