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采用脉冲激光烧蚀装置,在10 Pa的氩气环境下,在1～6 cm范围内调整衬底与靶的距离沉积制备了纳米Si薄膜。X射线衍射(XRD)谱和Raman谱测量均证实,纳米Si晶粒已经形成;利用扫描电子显微镜(SEM)观测了所形成的纳米Si薄膜的表面形貌。结果表明,随着靶衬间距的增加,所形成的纳米Si晶粒的平均尺寸减小(尺寸均匀性变差),在3 cm时达到最小值(尺寸分布最均匀),而后开始增大(尺寸均匀性变差)。利用蒙特-卡罗(MonteCarlo)方法,对不同靶衬间距下烧蚀产物的输运动力学过程进行了数值模拟,得到与实验结果相同的结论。
A pulsed laser ablation device was used to adjust the distance between the substrate and the target in the range of 1 ~ 6 cm under argon atmosphere of 10 Pa to prepare the nano-Si film. X-ray diffraction (XRD) and Raman spectrum measurements confirmed that the nano-Si grains had been formed. The surface morphology of the formed nano-Si films was observed by scanning electron microscopy (SEM). The results show that as the distance between target linings increases, the average size of the formed nano-Si grains decreases (the uniformity of size decreases), reaching the minimum value at 3 cm (the most uniform size distribution), and then begins to increase Size uniformity becomes worse). The Monte Carlo method is used to simulate the transport kinetics of ablated products with different target lining distances. The same conclusion is obtained with the experimental results.