论文部分内容阅读
研究了磁等离子体化学气相沉积的不同工艺条件对ＳｎＯ２薄膜导电性的影响．实验结果表明，外加适当位形、大小的纵向磁镜场，可使等离子体化学气相沉积技术中制备ＳｎＯ２薄膜所需的氧气流量降低，沉积时间缩短，且制得的薄膜电阻大大降低，轴向分布均匀性明显增强．对以上结果进行了分析和讨论．
The influence of different process conditions of magnetic plasma CVD on the electrical conductivity of SnO2 films was investigated. The experimental results show that the addition of a longitudinal magnetic field of appropriate shape and size can reduce the oxygen flow rate required for the preparation of SnO2 thin films by plasma CVD, reduce the deposition time and greatly reduce the sheet resistance, Distribution uniformity is significantly enhanced. The above results were analyzed and discussed.