为了增加 IC、LSI、VLSI 的生产,其中一条途径是在用硅单晶板大量生产硅元件时,使用玻璃的平滑平板。用计算机设计的非常复杂的线路模型是按中间板、主掩膜、工作掩膜的顺序烧制的。这种掩膜有涂着 AgCl 的乳胶以及蒸镀了金属铬和光致抗蚀剂的形式。这些光掩膜起着照相时负底片的作用。当用紫外线把电路模型晒制在硅片上时,要求非常高的定位精度。由光源产生的光对玻璃引起的热胀比较小,例如,使用石英玻璃等。而且根据集成度不同,可使用钠钙玻璃,铝硅酸盐玻璃等。这些玻璃不应存在气泡和不均匀杂质,玻璃表面要研磨得十分平滑。这些光掩膜玻璃要在超净室处理。据报道,1984年日本的光掩膜玻璃生产量即使除各公司内部自销 One of the ways to increase the production of ICs, LSIs, and VLSIs is to use glass flat plates for mass production of silicon devices using silicon single crystal plates. The very complicated circuit model designed with a computer is fired in the order of the middle plate, the main mask and the working mask. This mask is coated with AgCl latex and is vapor deposited with metallic chromium and photoresist. These photomasks function as negatives when taking pictures. When the circuit model is sun-dried on silicon with UV light, very high positioning accuracy is required. The light generated by the light source causes less thermal expansion of the glass, for example, quartz glass or the like is used. And depending on the level of integration, you can use soda-lime glass, aluminosilicate glass. These glasses should be free from air bubbles and uneven inclusions, and the glass surface should be ground very smoothly. These photomasks are processed in clean rooms. It is reported that in 1984, Japan’s production of photomask glass even though in addition to the company’s own sales