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本文叙述了步进光刻机在菲利浦研究实验室的最新进展中,该实验室已制成一种用于VLSI生产的高分辩率、高生产率、全自动化的分步重复硅片成像设备。本文着重於自动对准和高分辩率成像。自动对准系统是以间隙栅为基础的,其对准精度优于±0.1微米。它的对准时间短并且适应生产的需要,如片子自动进给。成像装置是一个受衍射限定的5倍缩小镜头,该透镜作过两个波长校正,其数值孔径为0.3,视场直径14毫米。此外本文还给出了硅片的分辩率和对准结果。
This article describes the latest developments in stepper lithography machines at Philips Research Laboratories that have produced a high-resolution, high-productivity, fully automated step-and-repeat wafer imaging device for VLSI production . This article focuses on auto-alignment and high-resolution imaging. The automatic alignment system is based on a gap grid with an alignment accuracy of better than ± 0.1 μm. It’s short alignment time and adapt to the production needs, such as automatic feeding of the film. The imaging device is a diffraction-limited 5x reduction lens that has been calibrated for two wavelengths with a numerical aperture of 0.3 and a field of view of 14 mm diameter. In addition, the paper also gives the resolution of silicon and alignment results.