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设计了一台抑制空间行波管多级降压收集极二次电子发射的、专用离子束处理设备。研究了Mo原子沉积速率对二次电子发射系数和表面织构的影响。无氧铜片基底上的试验结果表明,二次电子发射系数与Mo原子的沉积速率和表面织构密切相关。处理过程中基底温度起着重要作用。采用优化工艺得到的二次电子发射系数最大值下降到0.65,低于未经处理无氧铜基片的一半。初步试验表明,采用离子处理的多级降压收集极后,K和Ka波段的行波管的整管效率获得明显提高。
A special ion beam processing device was designed to suppress the secondary electron emission from multi-stage buck tube in space traveling wave tube. The effect of Mo atomic deposition rate on the secondary electron emission coefficient and surface texture was investigated. Experimental results on an oxygen-free copper substrate indicate that the secondary electron emission coefficient is closely related to the deposition rate and surface texture of Mo atoms. The substrate temperature plays an important role in the process. The maximum value of the secondary electron emission coefficient obtained by the optimization process is reduced to 0.65, which is lower than half of the untreated oxygen-free copper substrate. The preliminary tests show that the efficiency of the whole tube of traveling wave tube in K and Ka bands is obviously improved after ion-treated multi-stage buck collector.