采用溶胶-凝胶技术结合退火工艺在Pt(111)/Ti/SiO2/Si(100)基片上制备ZrW2O8薄膜,并研究了退火温度、退火时间对薄膜的影响。利用X射线衍射(XRD)及扫描电镜(SEM)对薄膜的物相及表面形貌进行表征;利用变温XRD研究薄膜的热膨胀性能。薄膜的变温XRD结果表明,在室温～700℃温度范围内,随着温度的升高,(211)和(310)晶面间距变小,其热膨胀系数为负值,而(332)晶面间距随温度升高变大,显示出正膨胀性质。这表明ZrW2O8薄膜材料的热膨胀性能是各向异性的。 The films of ZrW2O8 were prepared on the Pt (111) / Ti / SiO2 / Si (100) substrate by sol-gel technique combined with annealing process. The effects of annealing temperature and annealing time on the films were investigated. The phase and surface morphology of the films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The thermal expansion properties of the films were investigated by XRD. The temperature-programmed XRD results of the films show that the thermal expansion coefficients of the (211) and (310) planes decrease with the increase of the temperature in the temperature range of 700 ~ 700 ℃, As the temperature increases, it shows positive expansion properties. This shows that the thermal expansion properties of ZrW2O8 thin films are anisotropic.