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以溶胶-凝胶浸渍提拉法制备WO3光致变色薄膜。用色差计表征了材料的光致变色特性,并结合XRD、AFM、SEM、TEM、UV-Vis等手段,研究了热处理温度变化对其微观结构及光致变色性能的影响。结果表明,WO3薄膜光致变色性能随热处理温度升高而增强。当温度为350℃时,色差达到最大值2.2462,这是因为传导电子浓度随温度的升高而增大,有利于光生电子和空穴的产生,且此时禁带宽度最窄,电子易被激发到导带。当温度为400℃时,晶粒粗大,比表面积减小,光致变色性能降低。温度升至450℃时,晶格发生畸变,不利于电子空穴对分离,光致变色性能进一步降低。
WO3 Photochromic Thin Films Prepared by Sol - Gel Dip Curing Method. The photochromic properties of the materials were characterized by color difference meter. The effects of temperature on the microstructure and photochromic properties of the materials were studied by XRD, AFM, SEM, TEM and UV-Vis. The results show that the photochromic properties of WO3 films increase with the increase of heat treatment temperature. When the temperature is 350 ℃, the chromatic aberration reaches the maximum of 2.2462, because the conduction electron concentration increases with temperature, which is conducive to the generation of photo-generated electrons and holes, and the band gap is the narrowest at this time. The electrons are easily Excited to the conduction band. When the temperature is 400 ℃, the grains are coarse, the specific surface area decreases, and the photochromic properties decrease. When the temperature rises to 450 ℃, the crystal lattice distortion, is not conducive to electron-hole separation, further reducing the photochromic properties.