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用激光脉冲沉积技术生长、制备出了一系列不同真空度、不同衬底温度和不同激光脉冲能量的MgO薄膜。对生长、制备出的一系列MgO薄膜进行了椭偏光谱测量研究,在300~800nm光谱波长范围内,得到了不同条件下生长制备的MgO薄膜的光学常数谱和膜厚,其结果显示:真空度、衬底温度和激光脉冲能量对生长MgO薄膜的折射率、膜厚均有影响,高真空、高衬底温度和适中的激光脉冲能量有利于生长制备高折射率、高密度和高质量的MgO薄膜。
A series of MgO thin films with different vacuum degrees, different substrate temperatures and different laser pulse energies were prepared by laser pulse deposition. A series of MgO thin films grown and prepared were measured by ellipsometry. The optical constant spectra and film thicknesses of MgO thin films grown under different conditions were obtained in the spectral range of 300-800 nm. The results showed that the vacuum Degree, substrate temperature and laser pulse energy have an impact on the refractive index and film thickness of MgO thin films. High vacuum, high substrate temperature and moderate laser pulse energy are favorable for the growth and preparation of high refractive index, high density and high quality MgO film.