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基于国际半导体技术发展路线(ITRS)的预测,如果半导体工业不断提升其产品的复杂度和密集度,那么到2022年,量测技术将面临史无前例的困难和挑战。对于量测技术而言,光刻工艺始终是最大的一道难关,并且问题也主要出现在先进成像技术领域;目前,
Based on the International Technology Roadmap for Semiconductors (ITRS), if the semiconductor industry continues to increase the complexity and density of its products, measurement technology will face unprecedented challenges and challenges by 2022. For the measurement technology, lithography process is always the biggest obstacle, and the problem also appears in the field of advanced imaging technology; at present,