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采用Ti-Si复合靶在321不锈钢基体上用直流磁控反应溅射方法制得超硬纳米复合Ti-Si-N膜层,并借助能谱仪(EDX)、X射线衍射(XRD)、X光电子谱(XPS)、原子力显微镜(AFM)、纳米压入仪和划痕仪对膜层的成分、结构和力学性能进行了分析.结果表明:随着膜层中Si含量的增加,Ti-Si-N膜的硬度逐渐升高,当a(Si)=11.2%时达到峰值42 GPa;随着Si含量的进一步增长,膜层硬度开始下降.XRD和XPS结果显示,最硬的Ti-Si-N膜层包含大小约为8 nm的TiN纳米晶以及包围在其周围的非晶态Si3N4.XRD结果显示,随着Si的引入,膜层中TiN晶粒的择优取向由纯TiN膜层中的(111)变为Ti-Si-N膜层中的(200).划痕实验也显示了Si的添加对膜层结合力的影响.最后对该纳米复合膜的强化机制进行了探讨.
The Ti-Si-N films were prepared by DC magnetron reactive sputtering on 321 stainless steel substrate with Ti-Si composite target. The films were characterized by X-ray diffraction (XRD), X-ray diffraction The composition, structure and mechanical properties of the films were analyzed by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), nanoindentation and scratch tester.The results show that with the increase of Si content in the film, -N film increased gradually and reached 42 GPa at a (Si) = 11.2%. With the further increase of Si content, the hardness of the film started to decrease.The results of XRD and XPS showed that the hardest Ti-Si- The N-film contains TiN nanocrystals with a size of about 8 nm and the amorphous Si3N surrounding them. XRD results show that with the introduction of Si, the preferred orientation of the TiN grains in the film is determined by the (111) becomes (200) in the Ti-Si-N film.The scratch test also shows the effect of Si addition on the adhesion of the film.Finally, the strengthening mechanism of the nano-composite film is discussed.