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测得１１０ｋｅＶ５６Ｆｅ１＋离子注入麦胚中的射程为２５７．１ｎｍ．根据测得的５６Ｆｅ１＋离子相对浓度随深度的分布和注入离子的总面密度，求得了５６Ｆｅ１＋离子绝对浓度随深度的分布．采用ＴＲＩＭ８８程序计算得到了不同深度上注入离子的阻止本领，从而求得了随深度的能量沉积分布．并讨论了细胞损伤的可能机理。
The range of 110 keV56 Fe1 + ions implanted into wheat germ was measured as 257.1 nm. According to the measured relative concentration of 56Fe1 + ions with the depth of the distribution and the total surface area of the injected ions, the absolute concentration of 56Fe1 + ions with depth distribution was obtained. Using the TRIM88 program, we calculated the stopping power of ions implanted at different depths, and obtained the energy deposition distribution along with the depth. And discussed the possible mechanism of cell damage.