南京大学研制成功的快速辐射加热／超低压化学气相淀积系统可用于新型高频、高速微电子器件、光电子器件及集成电路、超晶格、量子阱等半导体材料和器件研究开发领域。较之目前通常采用的分子束外延、化学束外延、超高真空化学气相淀积、金属有机化学气相淀积等方法，设备简单 The rapid radiant heating / ultra-low pressure chemical vapor deposition system developed by Nanjing University can be used in the research and development of new high frequency, high speed microelectronic devices, optoelectronic devices and integrated circuits, superlattices, quantum wells and other semiconductor materials and devices. Compared with the current commonly used molecular beam epitaxy, chemical beam epitaxy, ultra-high vacuum chemical vapor deposition, metal organic chemical vapor deposition and other methods, the device is simple