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Axcelis技术公司推出可用于大流量注入及亚65nm器件制造的OptimaHD离子注入机。这种新型低能大剂量离子注入系统可提供200eV至80keV能量,采用高级点束技术进行注入,可确保晶圆上所有点从相同角度能看到同一光束;该系统还使用Axcelis专有RadiusScan技术,产量高,剂量覆盖范围广,
Axcelis Technologies Introduces the OptimaHD Ion Implanter for Large Flow Injection and Sub-65nm Device Manufacturing. The new low-energy, high-dose ion implantation system delivers 200eV to 80keV energy and is injected using advanced beam technology to ensure the same beam is visible at all points on the wafer from the same angle. The system also uses Axcelis’ proprietary RadiusScan technology, High output, a wide range of dose coverage,