采用磁激励射频等离子体增强化学气相沉积(M-RF-PECVD)方法,室温下分别在玻璃和Si(100)衬底上制备类金刚石(DLC)薄膜,通过扫描电镜(SEM)、傅里叶红外光谱(FTIR)和Raman光谱对不同沉积条件下制备的薄膜进行表征。结果表明,在反应压强为30 Pa、入射功率为50 W、CH4/Ar=5/90、衬底温度为40℃的实验条件下,制备的含氢DLC薄膜表面平整、结构致密,膜基结合度良好,薄膜中以sp3键为主。 Diamond-like carbon (DLC) films were prepared on glass and Si (100) substrates by using M-RF-PECVD at room temperature. Scanning electron microscopy The films prepared under different deposition conditions were characterized by infrared spectroscopy (FTIR) and Raman spectroscopy. The results show that under the conditions of reaction pressure of 30 Pa, incident power of 50 W, CH4 / Ar = 5/90 and substrate temperature of 40 ℃, the prepared hydrogen-containing DLC ​​films have smooth surface, Degree is good, sp3 key in the film.