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在真空室内原位测量了磁控溅射超薄铝膜的电阻率和薄膜厚度之间的关系以及各种工艺参数对其影响，薄膜的不同厚度阶段，具有不同的导电特性。分析表明：表面和晶界对传导电子的散射是构成薄膜电阻率尺寸效应的原因．
In-situ measurements of the relationship between the resistivity and the film thickness of the magnetron sputtering ultra-thin aluminum film and the influence of various process parameters on the thickness of the film have different conductivity characteristics. The analysis shows that the scattering of the conduction electrons at the surface and grain boundaries is the reason of the size effect of the film resistivity.