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本文描述了碳钢膏剂渗硅的工艺和理论。介绍了用金相、显微硬度,电子探针分析和X-射线结构分析等方法,测定渗硅层的组织结构及控制显微组织的工艺。在渗硅剂(组成:35—65%硅源粉、5%卤化物、30%防烧结剂)中加入比例大的卤化物,于1100—1180℃时对碳钢进行10—60分钟的膏剂渗硅,可得含硅量约为17.7%(重量)、厚度达0.18—1.2mm的渗层,其渗硅效率比气体法提高约一倍。氧化和腐蚀试验表明:渗硅层在750℃以下能有效地防止循环氧化;在40℃时能耐20%Ⅱ_?SO_4的腐蚀。此法操作简便,易于局部涂渗,渗层表面质量好。
This article describes the technology and theory of siliconizing carbon steel pastes. The microstructure, microstructure and structure of the siliconized layer were analyzed by metallography, microhardness, electron probe analysis and X-ray structure analysis. A large proportion of halide is added to a siliconizing agent (composition: 35-65% silicon source powder, 5% halide, 30% anti-sintering agent) and carbon steel is subjected to 10-60 minutes at 1100-1180 ° C Silicon seepage, available silicon content of about 17.7% by weight, the thickness of 0.18-1.2mm layer of infiltration, the silicon seepage efficiency than the gas method to improve about double. Oxidation and corrosion tests show that the silicon layer can effectively prevent cyclic oxidation below 750 ℃ and can withstand corrosion of 20% Ⅱ_? SO_4 at 40 ℃. This method is easy to operate, easy to local infiltration, seepage surface of good quality.