前言本文叙述一种目前已在若干重要领域达到工业应用阶段的崭新的金属表面处理方法,即离子注入法。运用这种方法,可将某些经过选择的原子以高能离子束的形式注入工件表面。迄今,这种方法因其对于改变半导体(如硅)的导电性能较之热扩散法更易于控制,已应用于半导体器件的制造。目前,全世界用于这一目的的离子注入机大约有500台。产品则为大家 Preface This article describes a new metal surface treatment method that has now reached the industrial application stage in several important areas, namely the ion implantation method. In this way, some of the selected atoms can be injected into the surface of the workpiece as high-energy ion beams. Hitherto, this method has been applied to the fabrication of semiconductor devices because it is easier to control than the thermal diffusion method for changing the conductivity of semiconductors such as silicon. At present, there are about 500 ion implanters in the world for this purpose. The product is for everyone