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With the rapid development of indium tin oxide(ITO)in the electronic display industry,choosing which raw powders to prepare high-quality ITO targets has always been a controversial topic.In the work,in order to clearly understand the effect of the raw powders on the microstructure and properties of ITO targets and thin films,tin-doped indium oxide(dITO)and In2O3-SnO2 mixed(mITO)powders were chosen to prepare ITO targets for depositing the films and a comparative study on their microstructure and properties was conducted.It is found that,(1)dITO targets possess a higher solid solubility of tin in indium oxide and more uniform elemental distribution,while there are a higher density,a finer grain size and a higher mass ratio of In2O3 to SnO2 for the mITO targets;(2)dITO films with more coarser columnar grains and a rougher surface prefer to grow along the[100]direction in an Ar atmosphere;(3)the conductive property of ITO films only depends on the doping amount of tin and is independent of the raw powders and the preparation process of the target source;(4)dITO films possess the superior optical property and narrower optical band gap;(5)the etching property of mITO films is superior to that of dITO films due to the lower solid solubility of tin in indium oxide.