【摘 要】
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Aluminum-doped zinc oxide (AZO) thin films were deposited on sapphire (002) andglass substrates by two different sputtering techniques radio frequency magnetron
【机 构】
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Department of Materials Science and Engineering,School of Advanced Materials Engineering
论文部分内容阅读
Aluminum-doped zinc oxide (AZO) thin films were deposited on sapphire (002) andglass substrates by two different sputtering techniques radio frequency magnetron cosputtering of AZO and ZnO targets and sputtering of an AZO target. The dependence of the photoluminescence (PL) and transmittance properties of the AZO films deposited by cosputtering and sputtering on the AZO/ZnO target power ratio, R and the O2/Ar flow ratio, r were investigated, respectively. Only a deep level emission peak appears in the PL spectra of cosputtered AZO films whereas both UV emission and deep level emission peaks are observed in the PL spectra of sputtered AZO films. The absorption edges in the transmittance spectra of the AZO films shift to the lower wavelength region as R and r increase. Effects ofcrystallinity, surface roughness, PL on the transmittance of the AZO films werealso explained using the X-ray diffraction (XRD), atomic force microscopy (AFM), and PL analysis results.
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