一、前言在真空和低压环境中,将可凝性原子(吸附原子)传输到一表面来制备薄膜。产生吸附原子的方法有热蒸发、物理溅射、气相粒子、其它蒸发源,诸如真空或等离子体电弧。影响薄膜各生长阶段的主要参数有基底温度;沉积速率;沉积粒子的入射角:荷能粒子的轰击。可利用荷能离子的轰击对基底表面改性或改变薄膜的成核及生长。一般情况下,这 I. INTRODUCTION Films are prepared by transferring condensable atoms (adsorbed atoms) to a surface in a vacuum and low pressure environment. Methods to generate adsorbed atoms include thermal evaporation, physical sputtering, vapor phase particles, other evaporation sources, such as vacuum or plasma arcs. The main parameters affecting the growth stages of the thin film are the substrate temperature; the deposition rate; the incident angle of the deposited particles: the bombardment of the charged particles. Ion bombardment can be used to modify the surface of the substrate or change the nucleation and growth of the film. Under normal circumstances, this