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在常温下 ,用 2 0 0、10 0keVHe离子按He Ti原子浓度比 0 1、0 3和 0 2的剂量注入纳米钛膜 ,采用现代表面分析技术对试样进行形貌观察与微观分析。测试分析结果表明 :注入前 ,沉积膜的原子力显微镜 (AFM )形貌像呈现从几十至 2 0 0nm以上极不均匀的晶粒尺度 ;注入后 ,3个试样的晶粒均有所长大 ,且随着注入剂量的增加 ,其长大趋势更为明显。这些长大的晶粒中同时存在大量的亚结构 ,表明在高剂量氦离子注入下 ,导致出现表层晶粒细化现象 ;He离子注入后的试样在衍射角 15°～ 40°之间出现可辨的衍射峰 ,其膜层内的平均晶粒尺寸约 13 6nm ,说明经离子注入后 ,膜层内纳米粒子的结晶度得到进一步提高 ,晶粒度比注入前长大。此结果证实了AFMB微米级视场的观察
At room temperature, nano-scale titanium films were implanted with 200, 10 keV He ions at He Ti atom concentration ratios of 0, 10 3 and 0 2. Morphology and microscopic analysis of the samples were performed using modern surface analysis techniques. The results of the test and analysis show that the atomic force microscopy (AFM) morphology of the deposited film shows a very non-uniform grain size from several tens to over 200 nm before injection, and the grain size of the three samples Large, and with the injection dose increases, the growth trend is more pronounced. The presence of a large number of substructures in these grown grains indicates that the grain refinement of the surface layer occurs under the high dose of helium ion implantation. The sample after He ion implantation appears at a diffraction angle of 15 ° -40 ° The discernable diffraction peak, the average grain size in the film layer is about 13 6nm, indicating that after ion implantation, the crystallinity of the nanoparticles in the film is further improved and the grain size grows before the implantation. This result confirms the observation of the AFMB micron-scale field of view