用射频磁控溅射制备ZnO薄膜,研究了溅射功率、溅射气体中氧氩以及工作气压对薄膜结构和光学性能的影响。通过对不同制备条件下的薄膜结构和薄膜的室温透射谱的分析,得到了磁控溅射制备ZnO薄膜的最佳工艺参数。 ZnO thin films were prepared by RF magnetron sputtering. The effects of sputtering power, oxygen and argon in the sputtering gas and operating pressure on the structure and optical properties of the films were investigated. The optimum process parameters of ZnO thin films prepared by magnetron sputtering were obtained by analyzing the film structure and the transmission spectra at room temperature under different preparation conditions.