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综述了近五年来为神光装置研制大口径熔石英采样光栅所取得的主要进展。提出了大尺寸采样光栅的化学机械抛光技术,将全息光刻-离子束刻蚀的430mm口径采样光栅的采样效率均匀性控制在均方根值低于5%,满足了采样光栅的设计要求。针对采样光栅的阈值特性,利用二次离子质谱技术,定量表征了采样光栅制备过程中引入的污染及其清洗效果,优化、发展了采样光栅的清洗方法。探索了基于氢氟酸和感应耦合等离子体刻蚀的熔石英基底处理技术,结合干湿法处理技术来去除熔石英光栅基底的亚表面损伤。为进一步提升采样光栅抗激光辐射损伤特性,提出将发展大尺寸熔石英采样光栅的氢氟酸处理方法及具有亚波长减反光栅结构的采样光栅的制备方法。
In this paper, the main progresses made during the last five years for developing a large-diameter fused silica sampling grating for SGU are summarized. The chemical mechanical polishing technology of large size sampling grating is proposed. The sampling efficiency uniformity of the 430mm sampling grating with holographic lithography and ion beam etching is controlled to less than 5% of the root mean square, which meets the design requirements of the sampling grating. Aiming at the threshold characteristic of sampling raster, the contamination introduced by the sampling raster and its cleaning effect were quantitatively characterized by secondary ion mass spectrometry. The sampling raster cleaning method was optimized and developed. The fused quartz substrate processing technology based on hydrofluoric acid and inductively coupled plasma etching was explored, and the sub-surface damage of the fused silica grating substrate was removed by combining the dry-wet processing technology. In order to further enhance the anti-laser radiation damage characteristics of sampling rasters, a method of processing hydrofluoric acid to develop a large-size fused silica sampling grating and a preparation method of a sampling raster with a sub-wavelength anti-reflection grating structure are proposed.