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采用直流磁控溅射的方法在Al2O3陶瓷管、硅基片上溅射制备了二氧化钛(TiO2)纳米薄膜材料.将薄膜样品放入管式退火炉中分别在500℃,700℃和1100℃温度下退火.由于退火温度的不同,薄膜的晶体结构、晶粒尺寸、晶向以及气敏特性都有所不同.利用X射线衍射(XRD)技术和薄膜气敏特性测试,分析了退火温度对薄膜气敏特性的影响.分析结果表明退火温度在500℃时,呈现锐钛矿结构,薄膜具有很好的选择性、很短的反应(恢复)时间.对TiO2薄膜表面进行修饰,发现此TiO2薄膜的最佳工作温度为370℃左右.薄膜的气敏机理也得到了讨论.
Titania (TiO2) nanostructured thin films were prepared by DC magnetron sputtering on Al2O3 ceramic tube and Si substrate.The samples were placed in a tube annealing furnace at 500 ℃, 700 ℃ and 1100 ℃ respectively Annealing.Due to the different annealing temperature, the crystal structure, grain size, crystal orientation and gas sensing properties of the films are different.Using X-ray diffraction (XRD) and gas sensing properties of the films, the effects of annealing temperature on the film gas The results show that anatase structure is obtained when the annealing temperature is 500 ℃, and the film has good selectivity and short reaction (recovery) time.On the surface of TiO2 film, The best working temperature is around 370 ° C. The gas sensing mechanism of the film has also been discussed.