利用MPCVD方法在玻璃基片上成功的制备了非常光滑、致密均匀的纳米金刚石膜。沉积工艺分为两步 :成核 ,CH4 /H2 =3% ;生长 ,O2 /CH4 /H2 =0 .3∶3∶10 0 ;沉积过程中保持工作压力为 4 .0kPa ,衬底温度 50 0℃。拉曼、透射电镜、红外光谱、表面轮廓仪等的测试表明 :膜层由纳米级金刚石晶粒组成 ,最大晶粒尺寸小于 10 0nm ,成核密度大于 10 11/cm2 。成核面晶粒的点阵常数较大 ,表明存在较多缺陷 ,表面粗糙度小于 2nm ,在可见光区完全透明 ,红外光学性能接近金刚石单晶理论值 The MPCVD method was used to fabricate a very smooth, dense and uniform nano-diamond film on a glass substrate. The deposition process is divided into two steps: nucleation, CH4 / H2 = 3%; growth, O2 / CH4 / H2 = 0.3: 3: 10 0; keeping the working pressure during deposition to 4.0 kPa, substrate temperature 50 ℃. Raman, TEM, FTIR, surface profilometry and other tests show that the film consists of nano-sized diamond grains with a maximum grain size of less than 100 nm and a nucleation density of more than 10 11 / cm 2. The larger lattice constant of the nucleation grains indicates more defects, the surface roughness is less than 2 nm, the crystal is completely transparent in the visible region and the infrared optical properties are close to the theoretical value of the diamond single crystal