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将自组装分子膜层(SAMs)技术与液相沉积技术(LPD)相结合,以氟钛酸氨((NH4)2TiF6)和硼酸(H3BO3)为原料配制反应前驱液,在镀有十八烷基三氯硅烷(OTS)自组装分子膜层的玻璃基底表面制备出与基底结合紧密、结构致密均一、厚度可控的纳米TiO2晶态薄膜。采用XRD、SEM和AFM等测试手段对薄膜的物相组成、显微结构和表面形貌进行了表征。结果表明:OTS-SAMs功能化基底对TiO2薄膜的沉积具有明显的诱导作用,当前驱液的(NH4)2TiF6浓度为0.05 mol.L-1,与H3BO3的摩尔比为3∶1,pH=3.0时,在50℃下沉积10 h后,无需退火,就可得到结晶良好的纯锐钛矿相TiO2晶态薄膜。
The self-assembled molecular layer (SAMs) technology and the liquid deposition technology (LPD) are combined to form a reaction precursor solution with ammonium fluorotitanate ((NH4) 2TiF6) and boric acid (H3BO3) Based on the glass substrate surface of the self-assembled monolayers of trichlorosilane (OTS), the nanostructured TiO2 thin films with close-packed, uniform structure and controlled thickness were prepared. The phase composition, microstructure and surface morphology of the films were characterized by XRD, SEM and AFM. The results show that the functionalized substrate of OTS-SAMs induces the deposition of TiO2 thin films. The concentration of (NH4) 2TiF6 in the current flooding solution is 0.05 mol.L-1, the molar ratio of H3BO3 to H3BO3 is 3:1, the pH is 3.0 After 10 h of deposition at 50 ° C, a pure crystalline anatase phase TiO2 crystalline thin film can be obtained without annealing.