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化学品和设备供应商致力于降低穿透硅通孔的填充成本，使其成为3-D集成的成本障碍。对每个子步骤都进行优化的多步填充工艺可以帮助进一步降低成本。
优化的TSV填充工艺降低成本
【摘 要】
：
化学品和设备供应商致力于降低穿透硅通孔的填充成本，使其成为3-D集成的成本障碍。对每个子步骤都进行优化的多步填充工艺可以帮助进一步降低成本。
【出 处】
：
集成电路应用
【发表日期】
：
2009年6期
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