论文部分内容阅读
L4513Ⅱ-16/ZM型全功能 微控四管扩散系统 国营北京建中机器厂研制。该设备供大规模集成电路生产线4″和3″硅片扩散、氧化等工艺使用,可配外径为ф166mm或ф140mm的石英管。工作温度范围为400~1300℃,恒温区长度≥760mm,控温精度700~1250℃时为±0.5℃、400~1300℃时为±1℃,可控升温速度0~1O℃/min,最大降温速度5℃/min。源柜气体流量由质量流量控制器控制,设定精度≤±2%(满程),气密性为10~(-8)ATM/secHe。该机采用TP805型微机全自动控制,各炉管独立工作,键盘或磁带机
L4513 Ⅱ-16 / ZM full-featured four-tube micro-diffusion system state-owned Beijing Jianzhong Machine Factory. The device for large-scale integrated circuit production line 4 “and 3” silicon diffusion, oxidation and other processes can be used outside diameter ф166mm or ф140mm quartz tube. The operating temperature range is 400 ~ 1300 ℃, the length of constant temperature zone is ≥760mm, the temperature control accuracy is ± 0.5 ℃ at 700 ~ 1250 ℃, ± 1 ℃ at 400 ~ 1300 ℃, the controllable heating rate is 0 ~ 10 ℃ / min, Cooling rate of 5 ℃ / min. Source cabinet gas flow control by the mass flow controller, setting accuracy ≤ ± 2% (full), air tightness of 10 ~ (-8) ATM / secHe. The machine uses TP805 microcomputer automatic control, the furnace tube work independently, keyboard or tape drive