论文部分内容阅读
用分光反射光谱(SR)和分光椭偏光谱(SE)来分析低温激光退火多晶硅薄膜的光学特性。利用多层光学和Braggeman有效介质近似模型(B-EMA),对薄膜光学常数和结构参数(膜厚度,表面粗糙度和非均匀性)的退火功率依存关系进行解析。解析结果表明,有一个临界退火功率存在。退火达到这个功率时,多晶硅薄膜的光学常数非常接近单晶硅。由于受增大晶粒尺寸影响,在这个功率时,薄膜表面粗糙度和非均匀性也显示了一峰值。在整个退火区域,膜厚度有大约8%变化。
Optical properties of cryogenic laser annealing polycrystalline silicon films were analyzed by spectroscopic reflectance spectroscopy (SR) and spectroscopic ellipsometry (SE). The dependence of annealing power on the optical constants and structural parameters (film thickness, surface roughness and inhomogeneity) of thin films was analyzed using multilayer optical and Braggeman effective medium approximation model (B-EMA). The analytical results show that there is a critical annealing power exists. When annealing reaches this power, the optical constant of the polysilicon film is very close to that of the single crystal silicon. Due to the effect of increased grain size, the film surface roughness and inhomogeneities also show a peak at this power. The thickness of the film varies by about 8% over the entire annealing area.