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精工爱普生公司(Seiko Epson)与JSR公司共同开发了一种采用液态涂布和喷墨成形工艺的硅薄膜。这种硅薄膜是一种低温多晶硅TFT (薄膜晶体管),其性能可与采用传统CVD(化学气相沉积)方法
Seiko Epson and JSR have jointly developed a silicon film using liquid coating and ink jet forming. This silicon thin film is a low-temperature polysilicon TFT (thin-film transistor) whose performance can be compared with the conventional CVD (Chemical Vapor Deposition) method