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微波等离子体化学气相沉积（ＭＰＣＶＤ）是制备金刚石薄膜的一种重要方法。为了获得金刚石薄膜的高速率大面积沉积，在国内首次研制成功了５ｋＷ带有石英真空窗的天线耦合水冷却不锈钢反应室式ＭＰＣＶＤ装置。初步用该装置成功在硅基片上沉积得到了金刚石薄膜。
Microwave plasma chemical vapor deposition (MPCVD) is an important method for preparing diamond films. In order to obtain a large area deposition of diamond films at high rates, a 5kW antenna with quartz vacuum window was successfully developed in China for the first time to couple water-cooled stainless steel chamber MPCVD devices. The device was successfully deposited on a silicon substrate to obtain a diamond film.