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研究了硅锗合金的氧化行为,首次发现快氧化生成的锗纳米膜复盖在氧化层上。在PL谱中,我们发现与锗纳米结构相关的一些新的谱峰。量子受限模型和新的算法被给出,较好地解释了PL谱的分布和形成机理。
The oxidation behavior of silicon-germanium alloy was studied. It was first found that the germanium nanofilm formed by rapid oxidation was covered on the oxide layer. In the PL spectrum, we find some new peaks related to germanium nanostructures. The quantum confinement model and the new algorithm are given, which better explain the distribution and formation mechanism of PL spectrum.